Our paper exploring the surface reactivity of LaFeO3 thin films with water using ambient pressure x-ray photoelectron spectroscopy (AP-XPS) has been published in Journal of Physical Chemistry Letters! This work was led by Kelsey Stoerzinger at Pacific Northwest National Lab, who performed AP-XPS measurements on LaFeO3 epitaxial thin films with FeO2 and LaO surface terminations at the Advanced Light Source at Lawrence Berkeley National Lab. The films were synthesized by Dr. Comes while he was at PNNL. We find that the LaO terminated surface is significantly more reactive to gaseous water molecules, forming hydroxyl groups on the surface which were easily measured in situ using AP-XPS.